Xiaoliang Ge

Research interests

Ultra low noise CMOS image sensor


Xiaoliang Ge was born in Beijing, China. She received the B.Sc degree in 2010 from South China University of Technology, China, and the M.Sc degree in 2012 from Delft University of Technology, the Netherlands, both in microelectronics. From August 2011 to July 2012, she worked at CMOSIS, Belgium, as an intern student for her master project. The project topic is about the design of a global shutter CMOS image sensor. She is currently a PhD candidate at the Electronic Instrumentation Laboratory of Delft University of Technology, working on the design of ultra low noise CMOS image sensor.


Electronic Instrumentation Laboratory
Delft University of Technology
Faculty of Electrical Engineering, Mathematics and Computer Science
Department of Micro-electronics and Computer Engineering
Mekelweg 4
2628 CD Delft
The Netherlands

Room: HB 15.300

Phone: +31 (0) 15 27 86518

Fax: +31 (0)15 27 85755

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