MSc L. Pakula

Technician
Electronic Instrumentation (EI), Department of Microelectronics

Expertise: MEMS / IC Processing / IC Characterization Lab / 3D-Design / Rapid prototyping / PHP/HTML/SQL / SolidWorks / Wirebonding

Themes: Precision Analog

Biography

Lukasz Pakula was born in Jelenia Gora, Poland. He studied at Wroclaw University of Technology, Poland, in Faculty of Electronics, where he received his M.Sc. degree in Electronics and Telecommunication in 2000. The same year he joined Electronic Instrumentation Laboratory at Delft University of Technology.

Publications

  1. A 0.05mm² 1V capacitance-to-digital converter based on period modulation
    Y. He; Z. Y. Chang; L. Pakula; S. H. Shalmany; M. Pertijs;
    In Dig. Techn. Papers IEEE International Solid-State Circuits Conference (ISSCC),
    IEEE, pp. 486‒487, February 2015. DOI: 10.1109/ISSCC.2015.7063138
    Abstract: ... This paper presents a digitally assisted period modulation (PM)-based capacitance-to-digital converter (CDC) that is >9× smaller than prior CDCs with >10b resolution, and improves the energy efficiency by >10× compared to previous PM-based CDCs. This is achieved with the help of a piece-wise charge transfer technique that eliminates the need for a large on-chip integration capacitor, a dual-integration-capacitor scheme that reduces the front-end noise contribution, a sampled-biasing technique that reduces the noise of the integration current, and a current-efficient inverter-based design.

  2. Fabrication of nanofluidic devices in glass with polysilicon electrodes
    V.G. Kutchoukov; L. Pakula; G.O.F. Parikesit; Y. Garini; L.K. Nanver; A. Bossche;
    Sensors and Actuators A: Physical: an international journal devoted to research and development of physical and chemical transducers,
    Volume 123-124, pp. 602-607, 2005. 100% EI.

  3. Fabrication of nanofluidic devices using glass-to-glass anodic bonding
    V.G. Kutchoukov; F. Laugere; W. van der Vlist; L. Pakula; Y. Garini; A. Bossche;
    Sensors and Actuators A: Physical: an international journal devoted to research and development of physical and chemical transducers,
    Volume 114, Issue 2-3, pp. 521-527, 2004. phpub 18.

  4. Nanofluidic devices in glass with Poly-Si electrodes
    V.G. Kutchoukov; L. Pakula; G.O.F. Parikesit; L.K. Nanver; A. Bossche;
    In s.n. (Ed.), SAFE 337f38aeae344dd3ad3d46be444f765b ProRISC 2004; Proceedings of semiconductor advances for future electronics,
    STW Technology Foundation, pp. 764-768, 2004.

  5. Nanochannels in Glass with Poly-Silicon Electrodes
    V.G. Kutchoukov; L. Pakula; G.O.F. Parikesit; Y. Garini; L.K. Nanver; A. Bossche;
    In s.n. (Ed.), Technical Digest of Eurosensors XVIII,
    s.n., pp. 32-35, 2004. phpub 40.

  6. Processing of inertial sensors using SF6-O2 Cryogenic plasma process
    G. Craciun; H. Yang; L. Pakula; M.A. Blauw;
    In s.n. (Ed.), SAFE 2003 Semiconductor advances for future electronics,
    Stichting voor de Technische Wetenschappen, pp. 683-686, 2003. CD-ROM.

  7. Fabrication of nanochannels using glass to glass anodic bonding
    V.G. Kutchoukov; F.P.J. Laugere; W. van der Vlist; L. Pakula; Y. Garini; P.F.A. Alkemade; A. Bossche;
    In s.n. (Ed.), TRANSDUCERS'03 Twelfth international conference on solid-state sensors, actuators and microsystems,
    IEEE, pp. 1327-1330, 2003. CD-ROM.

  8. Nanochannel fabrication technique for fluidic applications
    V.G. Kutchoukov; L. Pakula; Y. Garini; J.R. Mollinger; A. Bossche;
    In s.n. (Ed.), SAFE 2003 Semiconductor advances for future electronics,
    Stichting voor de Technische Wetenschappen, pp. 702-706, 2003. CD-ROM.

  9. Fabrication technology for nanofluidic channel devices for biochemical applications
    V.G. Kutchoukov; L. Pakula; Y. Garini; J.R. Mollinger; A. Bossche;
    In s.n. (Ed.), MME 2003 14th Micromechanics Europe workshop,
    s.n., pp. 167-170, 2003.

  10. Fabrication technology for twin nanochannels
    V.G. Kutchoukov; L. Pakula; J.R. Mollinger; A. Bossche;
    In s.n. (Ed.), EUROSENSORS 17th European conference on solid-state transducers,
    University of Minho, pp. 623-626, 2003. CD-ROM.

  11. In-situ doped PECVD SiC for surface micromachined devices
    C.R. de Boer; L. Pakula; P.M. Sarro; T.M.H. Pham;
    In J Saneistr; P Ripka (Ed.), Eurosensors XVI 16th European Conference on Solid-State Transducers,
    Czech Technical University, pp. 232-235, 2002.

  12. Influence of deposition parameters and temperature on stress and strain of In Situ doped PECVD silicon carbide
    T.M.H. Pham; C.R. de Boer; L. Pakula; P.M. Sarro;
    In S Yoshida (Ed.), ICSCRM2001 Proceedings of the International Conference on Silicon Carbide and Related Materials,
    Trans Tech Publications, pp. 759-762, 2002.

  13. Dry etching release of structures in post-processing surface micromachining using polyimide as a sacrificial layer
    A. Bagolini; H.M.T. Pham; T.L.M. Scholtes; L. Pakula; P.M. Sarro;
    In SAFE2001: proceedings,
    STW Technology Foundation, pp. 769-772, 2001.

  14. Coplanar waveguides and butt-joints on InP
    J.H. den Besten; D. Caprioli; L. Pakula; E. Smalbrugge; T. de Vries; J.J.M. Kwaspen; A.W. Roodnat; R. van Dijk; {van Vliet}, FE; XJM Leijtens; MK Smit;
    In {H Thienpont} (Ed.), Proceedings,
    VUBPress, pp. 197-200, 2001.

  15. Polyimide sacrificial layer for postprocessing surface micromachining
    A. Bagolini; T.L.M. Scholtes; H.M.T. Pham; L. Pakula; P.M. Sarro;
    In MME 2001,
    s.n., pp. 58-61, 2001.

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Last updated: 21 Dec 2022